| 摘要 |
PURPOSE:To accurately remove foreign matters without readhesion of foreign matters to the substrate by blowing only foreign matters scattering on the surface of substrate off the substrate by irradiating the surface of substrate with laser beam in such energy as not giving damage to the substrate. CONSTITUTION:When the surface of photo mask 1 is irradiated with laser beam 8 through movement of the X-Y table 3 and pivoting of a pivot mirror 9, some harmful foreign matters 11 such as dust existing on the upper surface of mask 1 burns with an energy of laser beam 8 and others are blown upward the photo mask 1 with thermal impact. The blown foreign matters 11 are exhausted to the outside of a chamber 4 through a pipe 5 owing to the exhaustion function comprising a vacuum pump. |
