| 摘要 |
PURPOSE:To provide a photosensitive compsn. capable of forming a fine resist pattern having excellent stability, high sensitivity, high resolution, and good cross-sectional shape. CONSTITUTION:This compsn. contains an alkali-soluble polymer and a compd. which produces acid by photo-irradiation. The alkali-soluble polymer is such a polymer having a phenol skelton in which a dissolution-inhibitting group unstable with acid expressed by formula is bonded to the phenol-type hydroxyl group. In the formula, R<1> is a substd. or unsubstd. hydrocarbon group, R<2> and R<3> are independently hydrogen, substd. or unsubstd. hydrocarbon groups, or polar groups, and n is a positive integer. When n is 1 and R<2> and R<3> are both hydrogen, R<1> is a hydrocarbon group of >5 carbon number. Thereby, the difference of solubility between an exposed area and unexposed area can be increased, and the pattern of high resolution can be formed. |
