发明名称 APPARATUS AND METHOD FOR RESIN-SEALING SEMICONDUCTOR DEVICE
摘要 PURPOSE:To obtain an apparatus and a method for resin-sealing a semiconductor device having high vacuum performance, a space conservation and high resin sealing performance by systematizing a vacuum evacuation passage and reducing a vacuum chamber volume. CONSTITUTION:An ejector chamber 100 surrounded by a lower mold chase 15, a lower mold ejector mechanism 17 and a frame 19 is vacuum-evacuated through a first vacuum evacuation passage 25. An ejector chamber 200 surrounded by an upper mold chase 31, an upper mold ejector mechanism 50 and a frame 51 is vacuum-evacuated through a second vacuum evacuation passage 37. A parting chamber 300 around parting surfaces is vacuum-evacuated through a third vacuum-evacuation passage 38. A volume to become vacuum chambers can be remarkably reduced, and efficiently vacuum-evacuated.
申请公布号 JPH0684986(A) 申请公布日期 1994.03.25
申请号 JP19920233488 申请日期 1992.09.01
申请人 MITSUBISHI ELECTRIC CORP 发明人 TANAKA SUEKICHI;SAKAKIBARA JUNJI;TSUTSUMI KOJI
分类号 B29C45/14;B29C45/26;B29C45/34;H01L21/00;H01L21/56;(IPC1-7):H01L21/56 主分类号 B29C45/14
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