发明名称 PROTECTIVE DEVICE FOR SEMICONDUCTOR IC
摘要 PURPOSE:To enhance the protection power by a method wherein the gate voltage of a MOS-FET to be protected is kept at a voltage below the drain-source withstand voltage BVDS, and the conduction resistance of the MOS-FET to be protected is reduced when the overvoltage is large. CONSTITUTION:The potential between the protection resistor R2 and the gate of the N type MOS-FETQ3 to be protected is divided by capacitors C1 and C2, and the result is supplied to the gate of an N type MOS-FETQ4; thus, the capacitances of the capacitors C1 and C2 are set in such a manner that the MOS- FETQ4 is not conducted during normal action. In the case of C1=0.1pF and C2=1.0pF, when an input terminal B comes into a voltage over 6.6V, the MOS- FETQ4 becomes conducted and starts discharge. However, when a point 2 comes into an increase in voltage, e.g. 18V, a point 3 comes into a voltage of 1.63V, and the gate voltage increases substantially, resulting in the enhancement of protection power.
申请公布号 JPS6115371(A) 申请公布日期 1986.01.23
申请号 JP19840136268 申请日期 1984.06.30
申请人 NIPPON DENKI KK 发明人 KOGA AKIHIKO
分类号 H03F1/52;H01L21/8234;H01L27/02;H01L27/088;H01L29/78;H02H7/20;H03F1/42 主分类号 H03F1/52
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