| 摘要 |
PURPOSE:To supply material vapor of a system to be supplied with a simple structure, stabilized pressure of the material, and good controllability by providing plural ruggedness to a part of the wall surface of a material vessel used in a gaseous phase growth device for thermally decomposing an organometal. CONSTITUTION:The vapor of a solid material is introduced through a valve 34 and a pipe 13 into a material vessel 32 having plural ruggedness at a part of the wall surface and used in a gaseous phase growth device for thermally decomposing an organometal, and deposited effectively and rapidly on the inner surface of a large area to form a uniform, minute, and comparatively thin layer 31 which is stored. By keeping the vessel 32 at a specified temp., the vapor pressure of the material in the vessel is always kept at a saturated vapor pressure which is determined by the wall surface temp. of the vessel. Consequently, the supply of the gaseous material is precisely controlled, and the gaseous material is sent to a system to be supplied. |
