| 摘要 |
<p>A method for producing a layered structure having first and second levels of metallisation, the method comprising forming the first level of metallisation by depositing a parting layer (6) on a spacer layer (4), etching the parting layer (6) and the spacer layer (4) to delineate field regions therein, depositing a first metal layer (10), depositing an etch barrier layer (12) and, dissolving the parting layer (6) to remove the first metal layer (10) and the etch barrier layer (12) in the field regions.</p> |
