发明名称 Polymeric sensitizers for photopolymer composition
摘要 Photopolymerizable composition consisting essentially of (A) at least one ethylenically unsaturated monomeric compound, (B) at least one 2,4,5-triarylimidazolyl dimer, (C) sensitizing amount of at least one polymeric sensitizer, weight average molecular weight 10,000 to 300,000, which is the reaction product of (1) a reactive photosensitizer and (2) a reactive polymer as defined herein, and (D) optionally an organic polymeric binder. The compositions are useful in photoresists, chemical milling, toning films and printing plates.
申请公布号 US4565769(A) 申请公布日期 1986.01.21
申请号 US19840673924 申请日期 1984.11.21
申请人 E. I. DU PONT DE NEMOURS AND COMPANY 发明人 DUEBER, THOMAS E.;MONROE, BRUCE M.
分类号 G03F7/032;G03F7/033;H05K3/00;H05K3/10;H05K3/18;H05K3/46 主分类号 G03F7/032
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