发明名称 Process for dot etching acid soluble photopolymerizable elements utilizing chemically soluble pigments
摘要 Process for preparation of dot-etched photopolymerizable lithographic film which comprises (a) exposing imagewise a photopolymerizable element consisting essentially of a support bearing (i) layer of acid soluble photopolymerizable composition having dispersed therein a chemically soluble pigment; or (ii), in order, (a) layer of acid soluble photopolymer having dispersed therein chemically soluble pigment, (b) layer of clear, unpigmented acid soluble photopolymer composition; or (iii), in order, (a) nonphotosensitive layer of an aqueous soluble polymeric binder having dispersed therein chemically soluble pigment, (b) layer of clear unpigmented acid soluble photopolymer composition, and optionally on each of said elements an overcoat layer; (b) developing the exposed element with acid solution; and (c) treating the developed element with a chemical solubilizing agent for the pigment. Lithographic films are prepared.
申请公布号 US4565770(A) 申请公布日期 1986.01.21
申请号 US19840670949 申请日期 1984.11.13
申请人 E. I. DU PONT DE NEMOURS AND COMPANY 发明人 HELD, ROBERT P.
分类号 G03F1/10;(IPC1-7):G03C5/16;G03C5/24;G03C5/38;G03C1/68 主分类号 G03F1/10
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