发明名称 FORMATION OF THIN FILM BY IRRADIATION OF LASER
摘要 PURPOSE:To form a uniform thin film having no secondary fine structure on a sample substrate by irradiating laser beam in the state of eliminating the stationary linear polarization state on the sample substrate in contact with a gaseous compd. to cause the photochemical reaction of the gaseous compd. CONSTITUTION:The visible laser beam emitted from a laser oscillator 1 is converted by the 2nd higher harmonic generator 2 to UV laser beam from which visible laser beam is removed by a filter 3 to make only the UV laser beam. The stationary linear polarization state of the laser beam is eliminated by a polarization eliminator 4 and the laser beam is condensed by a lens 5 and is irradiated on the sample substrate 6 in a thin film forming cell 7. An inert gas is introduced through the 1st gas feed port 13 into the cell 7 and is discharged through a discharge port 14 to replace the gas; thereafter, the compd. is introduced in the form of gas together with the carrier gas introduced through the 2nd gas feed port 16 from a cylinder 17 and is filled in the cell. A stage 18 on which the substrate 6 is imposed is moved within the plane perpendicular to the irradiating direction of the laser light by a motor 19, by which the photochemical reaction of the gaseous compd. is caused and the fine wire-shaped thin film is formed on the substrate 6.
申请公布号 JPS6112868(A) 申请公布日期 1986.01.21
申请号 JP19840132352 申请日期 1984.06.27
申请人 NIPPON DENKI KK 发明人 YOKOYAMA HIROYUKI
分类号 B23K26/12;C23C16/48;H01L21/205 主分类号 B23K26/12
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