发明名称 |
Photosensitive azide composition with alkali soluble polymer and process of using to form resist pattern |
摘要 |
A photosensitive composition comprising an equimolar condensation product of an aromatic azide compound having an aldehyde group and isophorone, and an alkali-soluble polymeric compound is a negative-type photoresist with a high resolution suitable for the fabrication of semiconductor devices.
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申请公布号 |
US4565768(A) |
申请公布日期 |
1986.01.21 |
申请号 |
US19840615749 |
申请日期 |
1984.05.31 |
申请人 |
HITACHI CHEMICAL COMPANY, LTD. |
发明人 |
NONOGAKI, SABURO;HASHIMOTO, MICHIAKI |
分类号 |
G03F7/008;H01L21/027;H01L21/312;(IPC1-7):G03C1/52;G03C1/71;G03F7/26 |
主分类号 |
G03F7/008 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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