| 摘要 |
PURPOSE:To form easily a 2-layered thin film having excellent characteristics on the surface of a film by sputtering a film substrate while passing the substrate over a target consisting of different kinds of targets in the moving direction, and passing an electric current through the target. CONSTITUTION:A polyester film 3 is moved in the direction as shown by the arrow 12, and passed over a target 5 on an electrode 11 to form a thin film on the film surface by sputtering. In this case, a target 5-1 of the lower oxide of Ti and a target 5-2 of the oxide of In and Sn (ITO) are joined at a surface 13 to form said target 5. A thin film layer of Ti oxide having excellent adhesiveness is firstly formed on the surface of the film 3, and a transparent ITO thin film having excellent electrical conductivity is secondarily formed with one operation. Or and ITO layer is firstly formed on the film 3, and an Si oxide film is then superposed thereon. Consequently, a thin film layer having excellent resistance to abrasion can be easily formed with one operation. |
