| 摘要 |
An appliance for forming a vapour-deposited or precipitated film has a vapour-deposition or precipitation chamber (30) in which a support (36) is retained, a halogen radical feed pipe (19) for feeding a radical which contains at least halogen atoms, into the chamber and a hydrogen radical feed pipe (31) for feeding a radical which contains hydrogen atoms, into the chamber, the halogen radical feed pipe and the hydrogen radical feed pipe each forming an angle of from 40 DEG to 50 DEG with the surface of the support, and the radicals forming a vapour-deposited film or precipitated film on the support. <IMAGE>
|
