发明名称 GAS FLOW CONTROL METHOD
摘要 A method for injecting a specific mass of gas to a specific point of use location uses a cavity (220) with a known volume which is filled with gas. The temperature and pressure of the gas in the cavity (220) are measured to set the conductivity of a control valve (230) located downstream of the cavity (220), after which the gas is released to the point of use location (280). As the gas is released from the cavity, the temperature and pressure of the gas in the cavity (220) changes. Based on the changes in temperature and pressure, the conductivity of the control valve (230) is adjusted to release the specific mass of the gas to the point of use location (280).
申请公布号 WO9734208(A1) 申请公布日期 1997.09.18
申请号 WO1997US03893 申请日期 1997.03.11
申请人 APPLIED MATERIALS, INC. 发明人 KACZOROWSKI, EDWARD, M.;MANOFSKY, WILLIAM, L., JR.;WILMER, MICHAEL, E.
分类号 G01F11/28;G05D7/06;(IPC1-7):G05D7/06 主分类号 G01F11/28
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