| 摘要 |
Adhesion promoter and process for lithographically patterning plasma oxide layers. To promote the adhesion of a lithographic resist to the plasma oxide surface, the surface is first prepared by applying a double adhesion promoter. The adhesion promoter includes individually cured layers of vinyltrichlorosilane (VTS) and 3-chloropropyltrimethoxysilane (Cl(CH2)3Si(OMe)3). A resist layer applied to the adhesion promoter prepared surface can subsequently be used in an optical lithography process, electron beam lithography process, or a hybrid optical/electron beam lithography process. |
