| 摘要 |
<p>Process for the continuous electrodeposition of metals at high current density in vertical cells, wherein the body to be plated, usually metal strip, follows first a decending path and then an ascending one, during both of which it traverses at least one electrolytic deposition cell through which is passed an electrolyte in turbulent flow, moving in the opposite direction in the descending stretch to that in the ascending stretch, so that in both stretches the fluid dynamics conditions are very uniform. Turbulent flow is induced, by creating a partial vacuum in each cell by educting a flow of electrolyte at one end of each cell in a vertical direction away from the cell. Preferably, the educed flow of electrolyte is countercurrent to the direction of strip movement.</p> |
