NOVEL STRIPPING COMPOSITION AND METHOD OF USING SAME

摘要

A novel stripping composition and method of using same is disclosed, which stripping composition comprises: (a) a solvent comprising one or more compounds of formula (I) (I) wherein R and R' are each selected independently from straight and branched alkyl having 1 to 3 carbon atoms, and phenyl, each of which phenyl is optionally substituted with one or more hydroxyl, or R and R' together are alkylene of 3 to 6 carbon atoms; and (b) a suitable organosulfonic acid. The stripping composition is especially useful for stripping positive photoresists faster and at lower temperatures than known strippers. A preferred composition comprises 10% by weight para-toluenesulfonic acid in dimethyl sulfoxide.