| 摘要 |
In a semiconductor exposure apparatus having chucks for holding a mask and a wafer, respectively, the holding portion of at least one of the chucks has a coefficient of linear expansion equal to or smaller than the coefficient of linear expansion of the bodies held. Particularly, the coefficient of linear expansion of the holding portion of the chuck should preferably be of a small absolute value, but even where the absolute value of the coefficient of linear expansion is great, the chucks are usable by providing temperature control.
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