| 摘要 |
PURPOSE:To form an uneven relief signal pattern, by irradiating a recording luminous flux upon an optical record carrier which is formed by successively forming a metallic thin film and thin film, whose state is changed when irradiated with lights, on a base board, and then, performing plasma etching. CONSTITUTION:A thin film 1 made of a single metal or metallic compound is formed on a disk base board 2 made of glass or an organic material, such as acryl, etc., and a thin film 3, whose state is changed when irradiated with lights, is formed on the thin film 1. The thin film 1 of this optical record carrier thus prepared is then irradiated with a laser flux formed by stopping laser lights 4 modulated at an objective lens 5 by means of a record signal. The optical wavelength of the laser lights 4 is set at >=5,000Angstrom and the metal of the thin film 1 at the irradiated section 6 is diffused into the thin film 3 and, as a result, the reflectivity of the heated part is changed. Moreover, the record carrier, in which the reflectivity change occurs, is subjected to plasma ethcing and signal pits are formed in the thin film 3 to form an uneven relief pattern, if necessary. Therefore, recorded signals can be converted into uneven relieves. |
