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发明名称
VERFAHREN ZUR IONENIMPLANTATION VON MOS-BAUELEMENTEN
摘要
申请公布号
DD231893(A1)
申请公布日期
1986.01.08
申请号
DD19840266462
申请日期
1984.08.21
申请人
TECHNISCHE HOCHSCHULE,KARL-MARX-STADT,,,DD
发明人
GESSNER,THOMAS,DD;VETTER,EGBERT,DD;TOLONICS,JOHANN,DD
分类号
H01J37/317;H01L21/265;(IPC1-7):H01L21/265
主分类号
H01J37/317
代理机构
代理人
主权项
地址
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