Apparatus for and a method of modifying the properties of a material.

摘要

Apparatus for and a method of modifying the properties of a material.

A single ion beam from a source (3) in a vacuum chamber (4) is deflected by an electrostatic deflection system (7) between a target (1) and a substrate (2). When on the target (1), the beam sputters material therefrom on to the substrate (2). When on the substrate (2) the beam bombards material previously deposited on it from the target which mixes it with the material of the substrate. A modified surface layer may therefore be achieved. The target (1) and substrate (2) may be moved relative to the beam if desired and the process may be monitored and controlled using appropriate sensors and controls.