| 摘要 |
<p>In a method of photolithography in which optical radiation is directed onto a layer of photoresist coated on a substrate, the tendency towards generation of spurious image features is much reduced by selecting the substrate and the optical radiation used in the exposure step so that the substrate is absorptive of said optical radiation. The use of, for example, a coloured glass substrate together with optical radiation of appropriate wavelength is found to be highly beneficial in maintaining accuracy of the resultant image.</p> |
