EQUIPO Y PROCEDIMIENTO PARA FABRICACION DE SENSORES DE GASESMEDIANTE DEPOSICION CONTROLADA DE OXIDOS DE ESTANO

摘要

The process consists of (a) loading the organo-metallic tin cpd. in an evaporation capsule (CVR1); heating to 400-600 deg.C; circulating the entrainment and reaction gas; heating until the bin cpd. is evaporated; and opening electro-valves (E3,Ev); (b) a reaction stage; and (c) reheating in an oxygen atmos. and sweeping with an argon stream for 10 mins. - The equipment consists of an inverted glass belt (CVI); a heating system for the hot plate (Pc); a nebulisation system (SN); a preparation and conditioning the tin cpd. in a second capsule (CVR2); and a general electrical system.