UN METODO DE GALVANOPLASTIA DE UN MATERIAL SOBRE UNA PRIME- RA SUPERFICIE DE UN DISPOSITIVO SEMICONDUCTOR

摘要

A non-destructive method of electro-coating a preselected pattern of electrically insulating or conducting material onto a semiconductor device which includes a photoresponsive junction. The method includes the step of illuminating the semiconductor device prior to initiating the flowing of electro-coating current therethrough. The method has particular utility in providing electroplated grid patterns and connections on large area photovoltaic cells. Also disclosed is the use of current generated by a photovoltaic cell to effect the electro-coating thereof.