| 摘要 |
A slim rod is heated to 1000 - 1300≦̸C in a chem. vapor deposition chamber. A gas mixt. and silicon halide-hydrogen reaction gases are thermally decompd. by contact with the slim rod. The addnl. silane increases the silicon decompn. rate, but its amount is limited to prevent free silicon particle or silicon halide polymer from attaching to the walls.
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