| 摘要 |
PROBLEM TO BE SOLVED: To provide a positive type electron beam or X-ray resist composition having high resolving power and a positive type electron beam or X-ray resist composition having high sensitivity as well as high resolving power. SOLUTION: In the positive type electron beam or X-ray resist compositions each containing (A) a compound which generates an acid when irradiated with electron beams or X-rays and (B1) a low molecular dissolution inhibiting compound having a group which can be decomposed by the action of the acid, having solubility in an alkali developing solution increased by the action of the acid and having a molecular weight of >1,000 to 3,000, the dissolution inhibiting compound has a structure formed by combining two or more triphenylmethane structures in an unconjugated state in a part where the group which can be decomposed by the action of the acid is not present. |
