发明名称 CHAMFER AND PERIPHERY POLISHING DEVICE
摘要 PURPOSE:To enable high accuracy to be maintained in polishing of a work even if its axis provides a large moving distance, for instance, when the periphery of a squared glass plate is polished, by arranging a wheel axis unit in a fixed position and forming a work axis rotary unit so that it may slide in the axial direction of a wheel on a machine bed. CONSTITUTION:A polishing device, turning both restricting plates 11c and restricting the end surface of a work 9 to the end surface of a master cam 4e, attractively fixes the work 9 onto a mounting bed 4d. Next the device, moving the mounting bed 4d and bringing the end surface of the work 9 into contact with the peripheral surface of a wheel 7e, polishes the periphery of the work by rotating its axis 4c and performs polishing of the peripheral surface while chamfering of the bottom of the work by rotating the mounting bed 4d, stopping a motor 6d. The device, after the finish polishing by one rotation of the mounting bed 4d, chamfers the upper of the work 9 by lowering a wheel axis 7d and performs finish chamfering by one rotation of the mounting bed 4d by stopping the motor 6d. In relation to the above, the mounting bed 4d stops facing to the direction of an original point being returned to the original point. Next, a removal material attracting unit 3g' lowers attractive lifting the work 9 to be dischargedto a discharge part.
申请公布号 JPS60263660(A) 申请公布日期 1985.12.27
申请号 JP19840117248 申请日期 1984.06.07
申请人 MARUMETSUKU KK 发明人 IGUCHI SHIYOUZOU
分类号 B24B9/10 主分类号 B24B9/10
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