| 摘要 |
PURPOSE:To form a satisfactory thin film on a substrate without exposing directly the substrate to plasma by disposing a needle-like metallic electrode to the center in each cylindrical metallic electrode so as to face said electrode and causing high-frequency glow discharge between both electrodes. CONSTITUTION:The substrate 11 and a heater 13 are provided to the suscepator 12 in a reaction chamber 10 and plural electrode parts 14 are supported by a support 15 above the the substrate 11 so as to face the substrate. The parts 14 are constituted of the cylindrical electrodes 16 to be used as the anode and the needle-like metallic electrodes 17 to be used as the cathode provided via an insulator 18 at the center thereof. A gas introducing port 21 communicating with the space in the support 15 is formed to te support 15 and plural gas introducing holes 22 around the electrodes 17 are formed to the insulator 18. A gaseous raw material is introduced through the port 21 and the holes 22 and the high-frequency glow discharge is caused between both electrodes in the above-mentioned constitution, by which the film is deposited on the substrate 11 without being affected by ions. |
