| 摘要 |
PURPOSE:To prevent the exfoliation of a material for vapor deposition and to improve the yield and performance of a chip type multi-layered interference filter by fixing a mask perforated with plural holes to a substrate and executing vacuum deposition in a way as to prevent sticking of the material for vapor deposition to the part intended for cutting thereby producing said filter. CONSTITUTION:The mask 2 perforated with the plural holes 3 having a desired size is fixed to the substrate 1 which is a sapphire substrate or the like. The substrate is fixed to a holder 5 and is attached to the prescribed position on a dome 6 for vacuum deposition. A high-refractive-index material and low-refractive-index material are alternately scattered from a vapor deposition source 7 and are deposited by evaporation on the substrate. The material for vapor deposition is deposited only on the substrate 1 exposed through the holes 3 of the mask. The materials are similarly deposited by vacuum evaporation on the rear surface of the substrate 1 and thereafter the substrate 1 is removed from the holder 5 and the mask 2 is removed from the substrate 1. The substrare 1 is cut along the parts 9 intended for cutting where the material 8 for vapor deposition is not deposited.
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