| 摘要 |
PURPOSE:To reduce the dispersion of the dimensional accuracy of a pattern, and to improve the quality of a product by forming a developer for a positive type resist by potassium phosphate, sodium metasilicate and pure water and specifying the mixing ratio of these substances. CONSTITUTION:A developer for a positive type resist is formed by potassium phosphate, sodium metasilicate and pure water. The mixing ratio of potassium phosphate, sodium metasilicate and pure water extends over 1:2:20-3:5:20. Accordingly, the dispersion of the dimensional accuracy of a pattern is reduced, and the quality of products is improved.
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