发明名称 INSPECTION DEVICE
摘要 <p>PURPOSE:To enable even inspection at a time when the size of a pattern to be inspected differs from a design data pattern by providing a means through which the magnification of image formation is varied while the optical path of an optical system image-forming a circuit forming pattern image to a sensor is kept constant. CONSTITUTION:A lens 19 is fitted to the upper section of an objective 9, and the pattern image of a photo-mask 1 image-formed by the objective 9 is image- formed to a pattern sensor 10. The lens 19 is driven by a motor 23 controlled by a magnification variable control section 25 connected to a microprocessor 15. Since data 12 in a magnetic tape and the error of magnification of the photo- mask 1 are determined previously on the manufacture of the photo-mask, the informations are inputted previously to the microprocessor 15. The magnification variable control section 25 drives the motor 23 on the basis of a command from the microprocessor 15, and moves the lens 19 up to a predetermined position.</p>
申请公布号 JPS60261133(A) 申请公布日期 1985.12.24
申请号 JP19840116387 申请日期 1984.06.08
申请人 HITACHI SEISAKUSHO KK 发明人 NOMOTO MINEO;AIUCHI SUSUMU
分类号 G01N21/88;G01N21/93;G01N21/956;G03F1/84;H01L21/027;H01L21/30;H01L21/66 主分类号 G01N21/88
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