| 发明名称 |
Ion beam deposition apparatus |
| 摘要 |
An ion beam deposition apparatus capable of uniformly distributing an ionized vaporized material on a desired area of a substrate is disclosed. The apparatus includes an accelerating electrode and a deflecting electrode each arranged between an ionization region and a substrate.
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| 申请公布号 |
US4559901(A) |
申请公布日期 |
1985.12.24 |
| 申请号 |
US19850696518 |
申请日期 |
1985.01.30 |
| 申请人 |
FUTABA DENSHI KOGYO K.K. |
发明人 |
MORIMOTO, KIYOSHI;TAKAGI, TOSHINORI |
| 分类号 |
C23C14/22;H01J37/317;(IPC1-7):C23C14/56 |
主分类号 |
C23C14/22 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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