发明名称 Ion source
摘要 An ion source apparatus of surface ionization type comprises an emitter tip in the form of a round rod having a sharp-pointed end, an ion source material holder for holding the emitter tip coaxially within a crucible made of a material of a high melting point, the crucible having an opening formed in a bottom wall thereof through which the sharp-pointed end of the emitter tip extends outwardly, the ion source material is being filled in the crucible so as to enclose the outer periphery of the sharp-pointed end of the emitter tip, a filament for emitting electrons with which the emitter tip is bombarded from below, a heating power supply for the filament, an ion beam extracting electrode disposed between the emitter tip and the filament and maintained at a potential of a substantially the level as that of the filament, and an accelerating voltage power supply for applying a high voltage between the ion beam extracting electrode and the emitter tip to accelerate the electrons and ion beam.
申请公布号 US4560907(A) 申请公布日期 1985.12.24
申请号 US19830505721 申请日期 1983.06.20
申请人 HITACHI, LTD. 发明人 TAMURA, HIFUMI;OKANO, HIROSHI;ISHITANI, TOHRU;SHIMASE, AKIRA
分类号 H01J37/08;B01J19/08;H01J3/04;H01J27/26;H01J49/16;(IPC1-7):H01J7/24;H05B31/26 主分类号 H01J37/08
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