发明名称 |
MASK PATTERN IMAGE FORMING APPARATUS |
摘要 |
A pre-alignment system for use in an apparatus including a fine alignment system. The pre-alignment system includes two optical imaging systems for imaging two alignment marks provided on a substrate for the purpose of fine alignment onto two radiation-sensitive detectors. The outputs signals of the detectors are indicative of the pre-alignments of a associated substrate mark relative to the associated detection systems. |
申请公布号 |
JPS60257450(A) |
申请公布日期 |
1985.12.19 |
申请号 |
JP19850111389 |
申请日期 |
1985.05.25 |
申请人 |
PHILIPS' GLOEILAMPENFABRIEKEN NV |
发明人 |
YAN EBAATO FUAN DERU UERUFU |
分类号 |
H01L21/30;G03F7/207;G03F9/00;H01L21/027 |
主分类号 |
H01L21/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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