| 摘要 |
PURPOSE:To enable effective evacuation resulting from reduced space of a treatment chamber and also to simplify operation of each unit in said chamber by designing a constitution, in which a substrate mounted on a substrate holder is enabled to be brought in contact with an etching electrode or is enabled to be located at predetermined position against a sputtering electrode. CONSTITUTION:A substrate holder 14 is located to predetermined position on a substrate holder support member 2 by operating a manipulator assembly 13. A coupled shaft 3a of an etching electrode assembly 3 is lowered by operating an elevating device 10 and the substrate holder support member 2 mounting substrate holder 14 thereon is abutted and fixed on a tip of a guide bar 9. The etching electrode 4a is further pushed down resisting a spring force 8 by operating by the elevating device 10 until contacting with the substrate holder 14 of the substrate holder support member 2. Thus, etching and cooling of a substrate are performed. Subsequently, a sputter electrode 4a, which is an opposite electrode, is impressed by RF voltage, and the etching electrode assembly 3 is moved by elevating device 10 so as to perform sputtering and the substrate is arranged to be located to the predetermined position.
|
