发明名称 |
SYSTEMS FOR MAGNIFICATION AND DISTORTION CORRECTION FOR IMPRINT LITHOGRAPHY PROCESSES |
摘要 |
<p>The present invention is directed toward a system to vary dimensions of a template in order to attenuate if not prevent distortions in an underlying pattern formed by the template. To that end, the system features a compression device that includes a pair of spaced-apart contact members to compress a perimeter surface of the template between the pair of spaced-apart contact members. The compression device includes first and second bodies, each has a contact member and an actuator arm. One of the actuator arms is coupled to the first body to reciprocate about an axis in response to variations of a volume of a bladder disposed adjacent to the actuator arm. In this manner, the distance between the two contact members may be varied.</p> |
申请公布号 |
KR20060034694(A) |
申请公布日期 |
2006.04.24 |
申请号 |
KR20067000555 |
申请日期 |
2006.01.09 |
申请人 |
MOLECULAR IMPRINTS, INC. |
发明人 |
CHOI, BYUNG JIN;SREENIVASAN SIDLGATA V.;MEISSL MARIO J. |
分类号 |
H01L21/027;G01L21/30;G03F;G03F7/00 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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