发明名称 SYSTEMS FOR MAGNIFICATION AND DISTORTION CORRECTION FOR IMPRINT LITHOGRAPHY PROCESSES
摘要 <p>The present invention is directed toward a system to vary dimensions of a template in order to attenuate if not prevent distortions in an underlying pattern formed by the template. To that end, the system features a compression device that includes a pair of spaced-apart contact members to compress a perimeter surface of the template between the pair of spaced-apart contact members. The compression device includes first and second bodies, each has a contact member and an actuator arm. One of the actuator arms is coupled to the first body to reciprocate about an axis in response to variations of a volume of a bladder disposed adjacent to the actuator arm. In this manner, the distance between the two contact members may be varied.</p>
申请公布号 KR20060034694(A) 申请公布日期 2006.04.24
申请号 KR20067000555 申请日期 2006.01.09
申请人 MOLECULAR IMPRINTS, INC. 发明人 CHOI, BYUNG JIN;SREENIVASAN SIDLGATA V.;MEISSL MARIO J.
分类号 H01L21/027;G01L21/30;G03F;G03F7/00 主分类号 H01L21/027
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