发明名称 |
Electrophotographic light-sensitive material |
摘要 |
An electrophotographic light-sensitive material is described, comprising an electrically conductive support, an amorphous silicon photoconductive layer on the support, and a layer of amorphous material containing at least carbon and halogen atoms is provided on the photoconductive layer. This material is free from a serious reduction in resolving power as is encountered in conventional electrophotographic light-sensitive materials when they are exposed to corona discharge, particularly negative corona discharge under high temperature/humidity conditions.
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申请公布号 |
US4559289(A) |
申请公布日期 |
1985.12.17 |
申请号 |
US19840627693 |
申请日期 |
1984.07.03 |
申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
SUNAGAWA, HIROSHI;KAWAJIRI, KAZUHIRO;KIDO, KEISHIRO;IIJIMA, TOSHIO;NOZAKI, NOBUHARU |
分类号 |
G03G5/08;G03G5/082;G03G5/14;(IPC1-7):G03G15/04 |
主分类号 |
G03G5/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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