发明名称 PROCESS CONTROL DEVICE
摘要 PURPOSE:To prevent a process from being overshot precisely by making a controlled variable follow a program pattern and adjusting the reducing width of a manipulated variable automatically in a device for controlling the process on the basis of the program pattern. CONSTITUTION:The deviation between the set value of a program pattern and its controlled variable is inputted by a deviation operating element 12 after a prescribed time has elapsed from the start of program pattern control and held by a diviation holding part 16. The deviatione is integrated by a double integration circuit 17 and the integrated value is added to the controlled variable to make the control variable follow said pattern. When the controlled variable approaches the unvariable area pattern of the program pattern by said deviation value, the deviation added to the controlled variable is removed to control the process.
申请公布号 JPS60254301(A) 申请公布日期 1985.12.16
申请号 JP19840111888 申请日期 1984.05.31
申请人 TOSHIBA KK 发明人 KOJIMA FUMIO
分类号 G05B7/02;(IPC1-7):G05B7/02 主分类号 G05B7/02
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