METHOD OF DESIGNING DUMMY PATTERNS FOR SEMICONDUCTOR DEVICES

摘要

A method for designing a dummy pattern of a semiconductor device is provided to obtain a third layout having good flatness characteristics by adding dot dummy patterns and linked line/space dummy patterns. A first layout forming process is performed to provide a first layout having main patterns(51). A second layout forming process is performed to form a second layout by adding oblique dot dummy patterns(61) to the first layout. The oblique dot dummy patterns have oblique rectangular dots or oblique circular dots. A third layout forming process is performed to form a third layout(50") by adding linked line/space dummy patterns(71,72,73,74) to the second layout.