发明名称 ELECTRON BEAM EXPOSURE
摘要 PURPOSE:To measure the temperature of a sample in a vacuum in high accuracy without contact by indirectly measuring the temperature of the sample measuring the distance between the plural marks provided for detection of position on the sample or on the cassette of the sample. CONSTITUTION:Plural marks previously separated with a definite distance are provided on a sample 30 or a cassette 40 which holds the sample 30. An electron beam is irradiated on these marks and the distance between the marks is measured using a laser length measuring circuit 52. The temperature or the variation of temperature of the sample 30 is detected from the measured distance between the marks. The values equivalent to the detected temperature, etc. are fed back to an electronically optical lens barrel 60.
申请公布号 JPS60254615(A) 申请公布日期 1985.12.16
申请号 JP19840110226 申请日期 1984.05.30
申请人 TOSHIBA KIKAI KK 发明人 NAKASUJI MAMORU;SUZUKI YOSHIO;TSUJI KAZUO;KASAHARA IZUMI
分类号 H01J37/305;G03F7/20;H01L21/027;H01L21/30 主分类号 H01J37/305
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