| 摘要 |
PURPOSE:To form a pattern good in heat stability by silylating intramolecular hydroxyl groups remaining unreacted after condensation reaction of 3-functional siloxane and removing them to form polysilylsesquioxane. CONSTITUTION:A pattern forming material is prepared by silylating polysilsesquioxane having unreacted hydroxide groups remaining in the molecule represented by formula I (in which R1-R4 are each alkyl, such as methyl, chloromethyl, or ethyl, or aryl, such as phenyl or chlorophenyl), with a silylating agent, such as formula II, X being halogen, to bring the hydroxyl groups of the compd. of formula I into reaction with the halogen of the compd. of formula II and to release them in the form of hydrogen halide. This material can form a thermally stable pattern while retaining high sensitivity, high resolution, etc., of the silicone resin. |
