| 摘要 |
PURPOSE:To improve the durability and film layer distribution, to increase the reliability, and to simplify a driving mechanism for an optical system and a photosensitive body by forming a seamless film of amorphous silicon on an annular seamless flexible film substrate. CONSTITUTION:A polyimide film substrate 21 while moved by substrate driving rollers 7-5 and 7-6 is heated by a substrate heating heater 6 and a depositing chamber 2 is evacuated to 1X10<-4>-10<-3>Torr and held in this state; and then a pot 4 containing Ti is heated to form a Ti film 22. Then, valves 14-1-14-3 are fully opened and a gas flow control valve 19 controls the flow rate of gaseous SiH4 to 10SCCM, the flow rate of gaseous B2H6 diluted with hydrogen to 60 SCCM, and the flow rate of gaseous hydrogen to 100SCCM. A this time, the degree of vacuum in the depositing chamber 1 is adjusted to 0.1-1Torr. In this state, high frequency electric power is applied for 10min and the valves 14-2 and 14-3 are closed; and the flow rate of SiH4 is held at 150SCCM for 30min to obtain an a-Si film 24 with 10mum overall film thickness. |
