| 摘要 |
PURPOSE:To achieve highly efficient ion beam machining as well as to allow machining by ion beams of more than two types, by arranging more than two ion sources or ion sources of more than two types in an ion beam device. CONSTITUTION:Ga liquid metal 12 is attached to the tip of a W filament 11, and Freon gas 14 is introduced to an alumina nozzle 13, plasmanized by a high frequency coil 15 and ejected form the nozzle end as a beam. Ga ion and F ions from the respective sources are accelerated and deflected by a accelerating plate 21 and deflecting coils 16, 17 respectively, and scanned on the surface of a sample 18 as beams for machining. |
