| 摘要 |
PURPOSE:To achieve the continuation of a process and to uniformize the particle size distribution of formed fine particles, by injecting a geseous mixture consisting of metal chloride vapor and the other element constituting an ultra-fine metal compound particles from a fan-shaped nozzle before heating the same at specific temp. CONSTITUTION:A high purity silicon metal powder having an average particle size of about 100mum is thrown in a first reaction vessel 1 and a vacuum pump 20 is operated to evacuate a first reaction chamber 2, a separation chamber 7 and a second reaction chamber 8 to 1.3X10<-5>atm. A valve 22 is opened to introduce hydrogen chloride gas into the reaction chamber 2 from a condenser 21 and the reaction chamber 2 is heated to about 1,400 deg.C by a graphite heater 3 to generate silicon tetrachloride gas and hydrogen gas. At the same time, when the vacuum pump 20 is operated to adjust the pressure ratio of the reaction chamber 2 and the separation chamber 7 to 10:1, a mixture of silicon tetrachloride and hydrogen is injected into the separation chamber 7 through a fan-shaped nozzle 4 operated under a deficient inflation condition.
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