发明名称 HIGH DENSITY SEMICONDUCTOR MEMORY DEVICE AND PROCESS FOR PRODUCING THE SAME
摘要 A charge-pump-memory device is disclosed which comprises an insulating substrate (11) on which are arranged: an n<+> semiconductor region (12) which constitutes a bit line; another n<+> semiconductor region (14) which constitutes a power supply line; and a p-type semiconductor region (13) between the two n<+> semiconductor regions which is a floating base region; a metal wiring layer (16) constituting a word line is situated on an insulating layer (15) over the semiconductor regions, the floating base region being separated from the wiring layer by only a thin portion of the insulating layer. The bit line runs parallel with the power supply line and perpendicular to the metal wiring constituting the word line.
申请公布号 DE3172837(D1) 申请公布日期 1985.12.12
申请号 DE19813172837 申请日期 1981.08.26
申请人 FUJITSU LIMITED 发明人 SASAKI, NOBUO
分类号 H01L29/78;H01L21/265;H01L21/768;H01L21/8242;H01L23/535;H01L27/10;H01L27/108;H01L29/786;(IPC1-7):H01L29/78;H01L21/86;G11C11/34;H01L27/12 主分类号 H01L29/78
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