摘要 |
PURPOSE:To obtain superior antistatic effect without causing adverse effect on the photographic characteristics even under severe developing conditions such as sensitivity increasing treatment, rapid processing treatment, etc. by incorporating a polymer having specified recurrent units in an antistatic layer provided in a photosensitive material. CONSTITUTION:The polymer having recurrent units expressed by the formula (wherein R1-R3 are alkyl, aralkyl, or at least two thereof joint to each other forming an N- contg, heterocyclic ring; n is 1-10; X<-> is an anion) is incorporated in the antistatic layer comprised of at least one layer. Such antistatic layer is preferred to be an outermost layer such as a surface protecting layer or a top- or backcoating layer, or a layer adjacent to the outermost layer. By providing such layer, generation of static electricity is retarded, influencing no adverse effect on a photosensitive material even if it is treated to have elevated sensitivity. No adverse influence is effected on the photographic characteristics even under severe condition such as rapid processing, etc. By this method, great efeffect is resulted on a usual black and white silver halide sensitive material, multilayered color photograhic sensitive material, particularly on the sensitive material for rapid processing at high temp., and highly sensitized sensitive material. |