| 摘要 |
PURPOSE:To completely prevent a coated silicide compound or oxide film or nitride film from separating by exposing the first layer organic surface with ozone atmosphere, and then coating the surface with the second layer silicide compound or oxide or nitride. CONSTITUTION:The first layer organic layer 2 is formed on an Si substrate 1. Then, an ozone generator is used to treat the surface of the layer 2. Then, a coated silicide compound layer 3 is formed. Thereafter, a resist pattern 4 is formed. Then, the pattern 4 is transferred to the layer 3 to form a pattern 3'. Thereafter, with the pattern 3' as a mask a pattern is transferred to the layer 2 to form a pattern 2'. A preferable pattern having no improper separation of the pattern 3' can be stably formed by the above step. |
