| 摘要 |
<p>An arrangement is disclosed for cutting off intensive radiation in projectors and/or illumination devices whose projection head, which projects the light, is mounted in a receptacle or holder rotatable about an azimuth axis so as to be swivelable about an additional axis arranged vertical to the azimuth axis. It comprises a cutoff mechanism which comprises a coupling member, and light-absorbing means or cutoff means, which is fixedly connected with the receptacle and which is rotatable jointly with the latter and with the projection head about the azimuth axis, wherein the light-absorbing or cutoff means are positioned in the cutoff position in front of the light outlet opening of the projection head or of an objective or in an intermediate image plane located within the projection head. The arrangement is suitable for application particularly with projection of image contents on plane, arched, or curved projection surfaces.</p> |
