发明名称 |
Purification of halide |
摘要 |
A process for the removal of hydrogen halides including HCl and HF, and/or sulfur dioxide from silicon tetrafluoride. Contaminated gaseous silicon tetrafluoride is passed through a column of zeolite preferably in the hydrogen cation form so as to permit recovery of silicon tetrafluoride containing less than about 10% of the original contamination levels. Acid-stable zeolite materials suitable for the process of the invention are subjected to a flow of hot gases to permit regeneration of the column for use in a semicontinuous process.
|
申请公布号 |
US4557921(A) |
申请公布日期 |
1985.12.10 |
申请号 |
US19840625355 |
申请日期 |
1984.06.27 |
申请人 |
ETHYL CORPORATION |
发明人 |
KIRSCH, WARREN B.;LAURENT, SEBASTIAN M. |
分类号 |
C01B33/107;(IPC1-7):C01B7/07;B01D53/00 |
主分类号 |
C01B33/107 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|