发明名称 Purification of halide
摘要 A process for the removal of hydrogen halides including HCl and HF, and/or sulfur dioxide from silicon tetrafluoride. Contaminated gaseous silicon tetrafluoride is passed through a column of zeolite preferably in the hydrogen cation form so as to permit recovery of silicon tetrafluoride containing less than about 10% of the original contamination levels. Acid-stable zeolite materials suitable for the process of the invention are subjected to a flow of hot gases to permit regeneration of the column for use in a semicontinuous process.
申请公布号 US4557921(A) 申请公布日期 1985.12.10
申请号 US19840625355 申请日期 1984.06.27
申请人 ETHYL CORPORATION 发明人 KIRSCH, WARREN B.;LAURENT, SEBASTIAN M.
分类号 C01B33/107;(IPC1-7):C01B7/07;B01D53/00 主分类号 C01B33/107
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