| 摘要 |
PURPOSE:To enable all the chips on a wafer to be position detected, by providing an original pattern rotating table for rotating an original pattern by the same quantity of rotation as the quantity of rotation of the wafer measured by a biaxial pattern detector independent from an exposing optical system. CONSTITUTION:An X-Y stage is positioned such that one of the patterns 6 in two chips spaced by a certain distance in the X direction on a wafer 4 is disposed below a biaxial detector, in order to measure the position of the pattern. The position of the other pattern is also measured in a similar manner, so that the error in rotational mounting of the wafer is obtained with respect to the X-Y stage from the difference in Y coordinate component between the values thus detected. From the difference in X coordinate component, the magnitude of expansion of the wafer is obtained. A reticle 2 is rotated with a rotating table 13 by a quantity equal to the quantity of rotation of the wafer, and thereafter the X-Y stage is fed at a constant ratio according to the result of detection so as to expose the pattern. According to this construction, there is no need of providing a rotary table for the wafer nor more than one optical system for effecting detection. |
