发明名称 SEMICONDUCTOR MANUFACTURING DEVICE
摘要 PURPOSE:To prevent the soft evaporation of a hydrogen flowing-in part consisting of quartz by a method wherein, in a device with which steam is obtained by burning hydrogen gas, a combustion chamber and a mixing chamber in which noninflammable gas is mixed in the steam generated in the combustion chamber are separately provided. CONSTITUTION:A combustion chamber 11, wherein hydrogen gas and oxygen gas are mixed and burned, is provided and at the same time, a mixing chamber 15 separated by an isolating plate 16 is provided. A hole 17 is formed on the isolating plate 16, and the steam generated in the combustion chamber 11 is introduced to the mixing chamber 15 through the intermediary of the hole 17. The diluting oxygen supplied from a flow-in hole 18 is mixed to the steam supplied from the hole 17 in the mixing chamber 15, and mixed substance is introduced into a processing tube 19. As the combustion chamber is provided separately from the mixing chamber as above-mentioned, a hydrogen flame 22 is maintained at a suitable temperature, thereby enabling to prevent the generation of soft evaporation of the quartz material constituting the nozzle part of a hydrogen flowing-in hole 14.
申请公布号 JPS60247933(A) 申请公布日期 1985.12.07
申请号 JP19840102681 申请日期 1984.05.23
申请人 OKI DENKI KOGYO KK 发明人 TOMINAGA YUKIHIRO
分类号 H01L21/31;H01L21/316 主分类号 H01L21/31
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